SPH-Based Nanoscale Indentation Simulation of Silicon Nitride Ceramics under Berkovich Indenter
Abstract
tablishes a nanoscale indentation simulation model of Si3N4 under a Berkovich indenter based on the Smoothed Particle Hydrodynamics (SPH)
method. The effects of the Berkovich indenter on the stress distribution in Si3N4 are investigated, and the relationship between indenter geom
etry and crack initiation is analyzed. The simulation results indicate that crack initiation in Si3N4 is more likely to occur at the tip and edges of
the indenter. These findings provide theoretical support for achieving high-efficiency and low-damage machining of Si3N4.
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DOI: http://dx.doi.org/10.70711/frim.v4i4.9046
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